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Searched for: 1 subject found.
2.391[J] Nanostructure Fabrication
(
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(Same subject as 6.6600[J])
Prereq: 2.710, 6.2370, 6.2600, or permission of instructor
Units: 4-0-8![]()
Describes current techniques used to analyze and fabricate nanometer-length-scale structures and devices. Emphasizes imaging and patterning of nanostructures, including fundamentals of optical, electron (scanning, transmission, and tunneling), and atomic-force microscopy; optical, electron, ion, and nanoimprint lithography, templated self-assembly, and resist technology. Surveys substrate characterization and preparation, facilities, and metrology requirements for nanolithography. Addresses nanodevice processing methods, such as liquid and plasma etching, lift-off, electroplating, and ion-implant. Discusses applications in nanoelectronics, nanomaterials, and nanophotonics.
K. K. Berggren